{
  "url": "https://openlegislation.uk/eu-regulation-2009-428/annex-I/division-4/division-2/division-2B005",
  "json_url": "https://openlegislation.uk/eu-regulation-2009-428/annex-I/division-4/division-2/division-2B005.json",
  "legislation": "eur/2009/428",
  "legislation_title": "Council Regulation (EC) No 428/2009 of 5 May 2009 setting up a Community regime for the control of exports, transfer, brokering and transit of dual-use items (Recast)",
  "legislation_url": "https://openlegislation.uk/eu-regulation-2009-428",
  "path": "annex/I/division/4/division/2/division/2B005",
  "kind": "division",
  "number": "[2B005]",
  "heading": "Equipment specially designed for the deposition, processing and in-process control of inorganic overlays, coatings and surface modifications, as follows, for substrates specified in column 2, by processes shown in column 1 in the Table following 2E003.f., and specially designed automated handling, positioning, manipulation and control components therefor:",
  "text": "a..Chemical vapour deposition (CVD) production equipment having all of the following:\nNB:\nSEE ALSO 2B105.\n1..A process modified for one of the following:\na..Pulsating CVD;\nb..Controlled nucleation thermal deposition (CNTD); or\nc..Plasma enhanced or plasma assisted CVD; and\n2..Having any of the following:\na..Incorporating high vacuum (equal to or less than 0,01 Pa) rotating seals; or\nb..Incorporating in situ coating thickness control;\nb..Ion implantation production equipment having beam currents of 5 mA or more;\nc..Electron beam physical vapour deposition (EB-PVD) production equipment incorporating power systems rated for over 80 kW and having any of the following:\n1..A liquid pool level \"laser\" control system which regulates precisely the ingots feed rate; or\n2..A computer controlled rate monitor operating on the principle of photo-luminescence of the ionised atoms in the evaporant stream to control the deposition rate of a coating containing two or more elements;\nd..Plasma spraying production equipment having any of the following:\n1..Operating at reduced pressure controlled atmosphere (equal to or less than 10 kPa measured above and within 300 mm of the gun nozzle exit) in a vacuum chamber capable of evacuation down to 0,01 Pa prior to the spraying process; or\n2..Incorporating in situ coating thickness control;\ne..Sputter deposition production equipment capable of current densities of 0,1 mA/mm2 or higher at a deposition rate of 15 μm/h or more;\nf..Cathodic arc deposition production equipment incorporating a grid of electromagnets for steering control of the arc spot on the cathode;\ng..Ion plating production equipment capable of the in situ measurement of any of the following:\n1..Coating thickness on the substrate and rate control; or\n2..Optical characteristics.\nNote:\n2B005 does not control chemical vapour deposition, cathodic arc, sputter deposition, ion plating or ion implantation equipment, specially designed for cutting or machining tools.",
  "extent": "E+W+S+N.I.",
  "status": null,
  "version": "current",
  "annotations": [
    {
      "type": "F",
      "label": "F1",
      "text": "Substituted by Commission Delegated Regulation (EU) 2020/1749 of 7 October 2020 amending Council Regulation (EC) No 428/2009 setting up a Community regime for the control of exports, transfer, brokering and transit of dual-use items."
    }
  ],
  "outstanding_effects": [],
  "provenance": {
    "source": "legislation.gov.uk",
    "source_url": "https://www.legislation.gov.uk/eur/2009/428/annex/I/division/4/division/2/division/2B005",
    "retrieved_at": "2026-11-01T14:51:29.916257+00:00"
  },
  "licence": "Open Government Licence v3.0",
  "licence_url": "https://www.nationalarchives.gov.uk/doc/open-government-licence/version/3/",
  "attribution": "Contains public sector information licensed under the Open Government Licence v3.0. Source: legislation.gov.uk, The National Archives."
}