{ "url": "https://openlegislation.uk/eu-regulation-2009-428/annex-I/division-4/division-5/division-2E301", "json_url": "https://openlegislation.uk/eu-regulation-2009-428/annex-I/division-4/division-5/division-2E301.json", "legislation": "eur/2009/428", "legislation_title": "Council Regulation (EC) No 428/2009 of 5 May 2009 setting up a Community regime for the control of exports, transfer, brokering and transit of dual-use items (Recast)", "legislation_url": "https://openlegislation.uk/eu-regulation-2009-428", "path": "annex/I/division/4/division/5/division/2E301", "kind": "division", "number": "[2E301]", "heading": "\"Technology\" according to the General Technology Note for the \"use\" of goods specified in 2B350 to 2B352.", "text": "Table\nDeposition techniques\nThe numbers in parenthesis refer to the Notes following this Table.\n1. Coating Process (1)\n2. Substrate\n3. Resultant Coating\nA. Chemical Vapour Deposition (CVD)\n\"Superalloys\"\nAluminides for internal passages\nCeramics (19) and Low expansion glasses (14)\nSilicides\nCarbides\nDielectric layers (15)\nDiamond\nDiamond-like carbon (17)\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nSilicides\nCarbides\nRefractory metals\nMixtures thereof (4)\nDielectric layers (15)\nAluminides\nAlloyed aluminides (2)\nBoron nitride\nCemented tungsten carbide (16), Silicon carbide (18)\nCarbides\nTungsten\nMixtures thereof (4)\nDielectric layers (15)\nMolybdenum and Molybdenum alloys\nDielectric layers (15)\nBeryllium and Beryllium alloys\nDielectric layers (15)\nDiamond\nDiamond-like carbon (17)\nSensor window materials (9)\nDielectric layers (15)\nDiamond\nDiamond-like carbon (17)\nB. Thermal-Evaporation Physical Vapour Deposition (TE-PVD)\nB1. Physical Vapour Deposition (PVD): Electron-Beam (EB-PVD)\n\"Superalloys\"\nAlloyed silicides\nAlloyed aluminides (2)\nMCrAlX (5)\nModified zirconia (12)\nSilicides\nAluminides\nMixtures thereof (4)\nCeramics (19) and Low expansion glasses (14)\nDielectric layers (15)\nCorrosion resistant steel (7)\nMCrAlX (5)\nModified zirconia (12)\nMixtures thereof (4)\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nSilicides\nCarbides\nRefractory metals\nMixtures thereof (4)\nDielectric layers (15)\nBoron nitride\nCemented tungsten carbide (16), Silicon carbide (18)\nCarbides\nTungsten\nMixtures thereof (4)\nDielectric layers (15)\nMolybdenum and Molybdenum alloys\nDielectric layers (15)\nBeryllium and Beryllium alloys\nDielectric layers (15)\nBorides\nBeryllium\nSensor window materials (9)\nDielectric layers (15)\nTitanium alloys (13)\nBorides\nNitrides\nB.2. Ion assisted resistive heating Physical Vapour Deposition (PVD) (Ion Plating)\nCeramics (19) and Low-expansion glasses\nDielectric layers (15)\nDiamond-like carbon (17)\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nDielectric layers (15)\nCemented tungsten carbide (16), Silicon carbide\nDielectric layers (15)\nMolybdenum and Molybdenum alloys\nDielectric layers (15)\nBeryllium and Beryllium alloys\nDielectric layers (15)\nSensor window materials (9)\nDielectric layers (15)\nDiamond-like carbon (17)\nB.3. Physical Vapour Deposition (PVD): \"Laser\" Vaporization\nCeramics (19) and Low expansion glasses (14)\nSilicides\nDielectric layers (15)\nDiamond-like carbon (17)\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nDielectric layers (15)\nCemented tungsten carbide (16), Silicon carbide\nDielectric layers (15)\nMolybdenum and Molybdenum alloys\nDielectric layers (15)\nBeryllium and Beryllium alloys\nDielectric layers (15)\nSensor window materials (9)\nDielectric layers (15)\nDiamond-like carbon (17)\nB.4. Physical Vapour Deposition (PVD): Cathodic Arc Discharge\n\"Superalloys\"\nAlloyed silicides\nAlloyed aluminides (2)\nMCrAlX (5)\nPolymers (11) and Organic \"matrix\"\"composites\"\nBorides\nCarbides\nNitrides\nDiamond-like carbon (17)\nC. Pack cementation (see A above for out-of-pack cementation) (10)\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nSilicides\nCarbides\nMixtures thereof (4)\nTitanium alloys (13)\nSilicides\nAluminides\nAlloyed aluminides (2)\nRefractory metals and alloys (8)\nSilicides\nOxides\nD. Plasma spraying\n\"Superalloys\"\nMCrAlX (5)\nModified zirconia (12)\nMixtures thereof (4)\nAbradable Nickel-Graphite\nAbradable materials containing Ni-Cr-Al\nAbradable Al-Si-Polyester\nAlloyed aluminides (2)\nAluminium alloys (6)\nMCrAlX (5)\nModified zirconia (12)\nSilicides\nMixtures thereof (4)\nRefractory metals and alloys (8)\nAluminides\nSilicides\nCarbides\nCorrosion resistant steel (7)\nMCrAlX (5)\nModified zirconia (12)\nMixtures thereof (4)\nTitanium alloys (13)\nCarbides\nAluminides\nSilicides\nAlloyed aluminides (2)\nAbradable Nickel-Graphite\nAbradable materials containing Ni-Cr-Al\nAbradable Al-Si-Polyester\nE. Slurry Deposition\nRefractory metals and alloys (8)\nFused silicides\nFused aluminides except for resistance heating elements\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nSilicides\nCarbides\nMixtures thereof (4)\nF. Sputter Deposition\n\"Superalloys\"\nAlloyed silicides\nAlloyed aluminides (2)\nNoble metal modified aluminides (3)\nMCrAlX (5)\nModified zirconia (12)\nPlatinum\nMixtures thereof (4)\nCeramics and Low- expansion glasses (14)\nSilicides\nPlatinum\nMixtures thereof (4)\nDielectic layers (15)\nDiamond-like carbon (17)\nTitanium alloys (13)\nBorides\nNitrides\nOxides\nSilicides\nAluminides\nAlloyed aluminides (2)\nCarbides\nCarbon-carbon, Ceramic and Metal \"matrix\"\"composites\"\nSilicides\nCarbides\nRefractory metals\nMixtures thereof (4)\nDielectric layers (15)\nBoron nitride\nCemented tungsten carbide (16), Silicon carbide (18)\nCarbides\nTungsten\nMixtures thereof (4)\nDielectric layers (15)\nBoron nitride\nMolybdenum and Molybdenum alloys\nDielectric layers (15)\nBeryllium and Beryllium alloys\nBorides\nDielectric layers (15)\nBeryllium\nSensor window materials (9)\nDielectric layers (15)\nDiamond-like carbon (17)\nRefractory metals and alloys (8)\nAluminides\nSilicides\nOxides\nCarbides\nG. Ion Implantation\nHigh temperature bearing steels\nAdditions of Chromium Tantalum or Niobium (Columbium)\nTitanium alloys (13)\nBorides\nNitrides\nBeryllium and Beryllium alloys\nBorides\nCemented tungsten carbide (16)\nCarbides\nNitrides\nTABLE - DEPOSITION TECHNIQUES - NOTES\n1..The term ‘coating process’ includes coating repair and refurbishing as well as original coating.\n2..The term ‘alloyed aluminide coating’ includes single or multiple-step coatings in which an element or elements are deposited prior to or during application of the aluminide coating, even if these elements are deposited by another coating process. It does not, however, include the multiple use of single-step pack cementation processes to achieve alloyed aluminides.\n3..The term ‘noble metal modified aluminide’ coating includes multiple-step coatings in which the noble metal or noble metals are laid down by some other coating process prior to application of the aluminide coating.\n4..The term ‘mixtures thereof’ includes infiltrated material, graded compositions, co-deposits and multilayer deposits and are obtained by one or more of the coating processes specified in the Table.\n5..‘MCrAlX’ refers to a coating alloy where M equals cobalt, iron, nickel or combinations thereof and X equals hafnium, yttrium, silicon, tantalum in any amount or other intentional additions over 0,01 % by weight in various proportions and combinations, except:\na..CoCrAlY coatings which contain less than 22 % by weight of chromium, less than 7 % by weight of aluminium and less than 2 % by weight of yttrium;\nb..CoCrAlY coatings which contain 22 to 24 % by weight of chromium, 10 to 12 % by weight of aluminium and 0,5 to 0,7 % by weight of yttrium; or\nc..NiCrAlY coatings which contain 21 to 23 % by weight of chromium, 10 to 12 % by weight of aluminium and 0,9 to 1,1 % by weight of yttrium.\n6..The term ‘aluminium alloys’ refers to alloys having an ultimate tensile strength of 190 MPa or more measured at 293 K (20 °C).\n7..The term ‘corrosion resistant steel’ refers to AISI (American Iron and Steel Institute) 300 series or equivalent national standard steels.\n8..‘Refractory metals and alloys’ include the following metals and their alloys: niobium (columbium), molybdenum, tungsten and tantalum.\n9..‘Sensor window materials’, as follows: alumina, silicon, germanium, zinc sulphide, zinc selenide, gallium arsenide, diamond, gallium phosphide, sapphire and the following metal halides: sensor window materials of more than 40 mm diameter for zirconium fluoride and hafnium fluoride.\n10..Category 2 does not include \"technology\" for single-step pack cementation of solid aerofoils.\n11..‘Polymers’, as follows: polyimide, polyester, polysulphide, polycarbonates and polyurethanes.\n12..‘Modified zirconia’ refers to additions of other metal oxides (e.g., calcia, magnesia, yttria, hafnia, rare earth oxides) to zirconia in order to stabilise certain crystallographic phases and phase compositions. Thermal barrier coatings made of zirconia, modified with calcia or magnesia by mixing or fusion, are not controlled.\n13..‘Titanium alloys’ refers only to aerospace alloys having an ultimate tensile strength of 900 MPa or more measured at 293 K (20 °C).\n14..‘Low-expansion glasses’ refers to glasses which have a coefficient of thermal expansion of 1 × 10–7 K–1 or less measured at 293 K (20 °C).\n15..‘Dielectric layers’ are coatings constructed of multi-layers of insulator materials in which the interference properties of a design composed of materials of various refractive indices are used to reflect, transmit or absorb various wavelength bands. Dielectric layers refers to more than four dielectric layers or dielectric/metal \"composite\" layers.\n16..‘Cemented tungsten carbide’ does not include cutting and forming tool materials consisting of tungsten carbide/(cobalt, nickel), titanium carbide/(cobalt, nickel), chromium carbide/nickel-chromium and chromium carbide/nickel.\n17..\"Technology\" for depositing diamond-like carbon on any of the following is not controlled:\nmagnetic disk drives and heads, equipment for the manufacture of disposables, valves for faucets, acoustic diaphragms for speakers, engine parts for automobiles, cutting tools, punching-pressing dies, office automation equipment, microphones or medical devices or moulds, for casting or moulding of plastics, manufactured from alloys containing less than 5 % beryllium.\n18..‘Silicon carbide’ does not include cutting and forming tool materials.\n19..Ceramic substrates, as used in this entry, does not include ceramic materials containing 5 % by weight, or greater, clay or cement content, either as separate constituents or in combination.\nTABLE - DEPOSITION TECHNIQUES - TECHNICAL NOTE\nProcesses specified in Column 1 of the Table are defined as follows:\na..Chemical Vapour Deposition (CVD) is an overlay coating or surface modification coating process wherein a metal, alloy, \"composite\", dielectric or ceramic is deposited upon a heated substrate. Gaseous reactants are decomposed or combined in the vicinity of a substrate resulting in the deposition of the desired elemental, alloy or compound material on the substrate. Energy for this decomposition or chemical reaction process may be provided by the heat of the substrate, a glow discharge plasma, or \"laser\" irradiation.\nN.B.1.\nCVD includes the following processes: directed gas flow out-of-pack deposition, pulsating CVD, controlled nucleation thermal deposition (CNTD), plasma enhanced or plasma assisted CVD processes.\nN.B.2.\nPack denotes a substrate immersed in a powder mixture.\nN.B.3.\nThe gaseous reactants used in the out-of-pack process are produced using the same basic reactions and parameters as the pack cementation process, except that the substrate to be coated is not in contact with the powder mixture.\nb..Thermal Evaporation-Physical Vapour Deposition (TE-PVD) is an overlay coating process conducted in a vacuum with a pressure less than 0,1 Pa wherein a source of thermal energy is used to vaporize the coating material. This process results in the condensation, or deposition, of the evaporated species onto appropriately positioned substrates.\nThe addition of gases to the vacuum chamber during the coating process to synthesize compound coatings is an ordinary modification of the process.\nThe use of ion or electron beams, or plasma, to activate or assist the coating’s deposition is also a common modification in this technique. The use of monitors to provide in-process measurement of optical characteristics and thickness of coatings can be a feature of these processes.\nSpecific TE-PVD processes are as follows:\n1..Electron Beam PVD uses an electron beam to heat and evaporate the material which forms the coating;\n2..Ion Assisted Resistive Heating PVD employs electrically resistive heating sources in combination with impinging ion beam(s) to produce a controlled and uniform flux of evaporated coating species;\n3..\"Laser\" Vaporization uses either pulsed or continuous wave \"laser\" beams to vaporize the material which forms the coating;\n4..Cathodic Arc Deposition employs a consumable cathode of the material which forms the coating and has an arc discharge established on the surface by a momentary contact of a ground trigger. Controlled motion of arcing erodes the cathode surface creating a highly ionized plasma. The anode can be either a cone attached to the periphery of the cathode, through an insulator, or the chamber. Substrate biasing is used for non line-of-sight deposition;\nNB:\nThis definition does not include random cathodic arc deposition with non-biased substrates.\n5..Ion Plating is a special modification of a general TE-PVD process in which a plasma or an ion source is used to ionize the species to be deposited, and a negative bias is applied to the substrate in order to facilitate the extraction of the species from the plasma. The introduction of reactive species, evaporation of solids within the process chamber, and the use of monitors to provide in-process measurement of optical characteristics and thicknesses of coatings are ordinary modifications of the process.\nc..Pack Cementation is a surface modification coating or overlay coating process wherein a substrate is immersed in a powder mixture (a pack), that consists of:\n1..The metallic powders that are to be deposited (usually aluminium, chromium, silicon or combinations thereof);\n2..An activator (normally a halide salt); and\n3..An inert powder, most frequently alumina.\nThe substrate and powder mixture is contained within a retort which is heated to between 1 030 K (757 °C) and 1 375 K (1 102 °C) for sufficient time to deposit the coating.\nd..Plasma Spraying is an overlay coating process wherein a gun (spray torch) which produces and controls a plasma accepts powder or wire coating materials, melts them and propels them towards a substrate, whereon an integrally bonded coating is formed. Plasma spraying constitutes either low pressure plasma spraying or high velocity plasma spraying.\nN.B.1.\nLow pressure means less than ambient atmospheric pressure.\nN.B.2.\nHigh velocity refers to nozzle-exit gas velocity exceeding 750 m/s calculated at 293 K (20 °C) at 0,1 MPa.\ne..Slurry Deposition is a surface modification coating or overlay coating process wherein a metallic or ceramic powder with an organic binder is suspended in a liquid and is applied to a substrate by either spraying, dipping or painting, subsequent air or oven drying, and heat treatment to obtain the desired coating.\nf..Sputter Deposition is an overlay coating process based on a momentum transfer phenomenon, wherein positive ions are accelerated by an electric field towards the surface of a target (coating material). The kinetic energy of the impacting ions is sufficient to cause target surface atoms to be released and deposited on an appropriately positioned substrate.\nN.B.1.\nThe Table refers only to triode, magnetron or reactive sputter deposition which is used to increase adhesion of the coating and rate of deposition and to radio frequency (RF) augmented sputter deposition used to permit vaporisation of non-metallic coating materials.\nN.B.2.\nLow-energy ion beams (less than 5 keV) can be used to activate the deposition.\ng..Ion Implantation is a surface modification coating process in which the element to be alloyed is ionized, accelerated through a potential gradient and implanted into the surface region of the substrate. This includes processes in which ion implantation is performed simultaneously with electron beam physical vapour deposition or sputter deposition.", "extent": null, "status": null, "version": "current", "annotations": [ { "type": "F", "label": "F1", "text": "Substituted by Commission Delegated Regulation (EU) 2020/1749 of 7 October 2020 amending Council Regulation (EC) No 428/2009 setting up a Community regime for the control of exports, transfer, brokering and transit of dual-use items." }, { "type": "F", "label": "F2", "text": "Word in Annex 1 Table Note 10 substituted (31.3.2023) by The Export Control (Military and Dual-Use Lists) (Amendment) Regulations 2023 (S.I. 2023/302), regs. 1, 5(2)(c)(iv)" }, { "type": "F", "label": "F3", "text": "Word in Annex 1 2E Technical Note substituted (20.5.2025) by The Export Control (Amendment) Regulations 2025 (S.I. 2025/532), regs. 1(2), 10(4)(b)(i)(aa)" }, { "type": "F", "label": "F4", "text": "Word in Annex 1 2E Technical Note substituted (20.5.2025) by The Export Control (Amendment) Regulations 2025 (S.I. 2025/532), regs. 1(2), 10(4)(b)(i)(bb)" }, { "type": "F", "label": "F5", "text": "Word in Annex 1 2E Technical Note substituted (20.5.2025) by The Export Control (Amendment) Regulations 2025 (S.I. 2025/532), regs. 1(2), 10(4)(b)(i)(cc)" }, { "type": "F", "label": "F6", "text": "Word in Annex 1 2E Technical Note substituted (20.5.2025) by The Export Control (Amendment) Regulations 2025 (S.I. 2025/532), regs. 1(2), 10(4)(b)(ii)(aa)" }, { "type": "F", "label": "F7", "text": "Word in Annex 1 2E Technical Note substituted (20.5.2025) by The Export Control (Amendment) Regulations 2025 (S.I. 2025/532), regs. 1(2), 10(4)(b)(ii)(bb)" }, { "type": "footnote", "label": "f1", "text": "The numbers in parenthesis refer to the Notes following this Table." } ], "outstanding_effects": [ { "type": "word omitted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "word 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"The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "word substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words omitted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words omitted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words inserted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", "affecting_title": "The Export Control (Amendment) Regulations 2026" }, { "type": "words substituted", "affecting": "uksi/2026/1150", 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Source: legislation.gov.uk, The National Archives." }