# Council Regulation (EC) No 428/2009 of 5 May 2009 setting up a Community regime for the control of exports, transfer, brokering and transit of dual-use items (Recast), Division [3C002]: Resist materials as follows and "substrates" coated with the following resists:


a..Resists designed for semiconductor lithography as follows:
1..Positive resists adjusted (optimised) for use at wavelengths less than 193 nm but equal to or greater than 15 nm;
2..Resists adjusted (optimised) for use at wavelengths less than 15 nm but greater than 1 nm;
b..All resists designed for use with electron beams or ion beams, with a sensitivity of 0,01 μcoulomb/mm2 or better;
c..Not used;
d..All resists optimised for surface imaging technologies;
e..All resists designed or optimised for use with imprint lithography equipment specified in 3B001.f.2. that use either a thermal or photo-curable process.

---
Source: https://www.legislation.gov.uk/eur/2009/428/annex/I/division/5/division/3/division/3C002 (the official version)
Page: https://openlegislation.uk/eu-regulation-2009-428/annex-I/division-5/division-3/division-3C002
Contains public sector information licensed under the Open Government Licence v3.0. Source: legislation.gov.uk, The National Archives.