Division Technology
United Kingdom
2E001"Technology" according to the General Technology Note for the "development" of equipment or "software" specified in 2A, 2B or 2D.
2E002"Technology" according to the General Technology Note for the "production" of equipment specified in 2A or 2B.
2E003Other "technology", as follows:
- a..
Not used;
- b..
"Technology" for metal-working manufacturing processes, as follows:
- 1..
"Technology" for the design of tools, dies or fixtures specially designed for any of the following processes:
- a..
"Superplastic forming";
- b..
"Diffusion bonding"; or
- c..
‘Direct-acting hydraulic pressing’;
- a..
- 2..
Technical data consisting of process methods or parameters as listed below used to control:
- a..
"Superplastic forming" of aluminium alloys, titanium alloys or "superalloys":
- 1..
Surface preparation;
- 2..
Strain rate;
- 3..
Temperature;
- 4..
Pressure;
- 1..
- b..
"Diffusion bonding" of "superalloys" or titanium alloys:
- 1..
Surface preparation;
- 2..
Temperature;
- 3..
Pressure;
- 1..
- c..
‘Direct-acting hydraulic pressing’of aluminium alloys or titanium alloys:
- 1..
Pressure;
- 2..
Cycle time;
- 1..
- d..
‘Hot isostatic densification’ of titanium alloys, aluminium alloys or "superalloys":
- 1..
Temperature;
- 2..
Pressure;
- 3..
Cycle time;
- 1..
Technical Notes:
- 1..
‘Direct-acting hydraulic pressing’ is a deformation process which uses a fluid-filled flexible bladder in direct contact with the workpiece.
- 2..
‘Hot isostatic densification’ is a process of pressurising a casting at temperatures exceeding 375 K (102 °C) in a closed cavity through various media (gas, liquid, solid particles, etc.) to create equal force in all directions to reduce or eliminate internal voids in the casting.
- a..
- 1..
- c..
"Technology" for the "development" or "production" of hydraulic stretch-forming machines and dies therefor, for the manufacture of airframe structures;
- d..
Not used;
- e..
"Technology" for the "development" of integration "software" for incorporation of expert systems for advanced decision support of shop floor operations into "numerical control" units;
- f..
"Technology" for the application of inorganic overlay coatings or inorganic surface modification coatings (specified in column 3 of the following table) to non-electronic substrates (specified in column 2 of the following table), by processes specified in column 1 of the following table and defined in the Technical Note.
Note:
The table and Technical Note appear after entry 2E301.
NB:
This table should be read to specify the "technology" for a particular Coating Process only when the Resultant Coating in column 3 is in a paragraph directly across from the relevant Substrate under column 2. For example, Chemical Vapour Deposition (CVD) coating process technical data are included for the application of silicides to carbon-carbon, ceramic and metal "matrix""composites" substrates, but are not included for the application of silicides to ‘cemented tungsten carbide’ (16), ‘silicon carbide’ (18) substrates. In the second case, the resultant coating is not listed in the paragraph under column 3 directly across from the paragraph under column 2 listing ‘cemented tungsten carbide’ (16), ‘silicon carbide’ (18).
2E101"Technology" according to the General Technology Note for the "use" of equipment or "software" specified in 2B004, 2B009, 2B104, 2B109, 2B116, 2B119 to 2B122 or 2D101.
2E201"Technology" according to the General Technology Note for the "use" of equipment or "software" specified in 2A225, 2A226, 2B001, 2B006, 2B007.b., 2B007.c., 2B008, 2B009, 2B201, 2B204, 2B206, 2B207, 2B209, 2B225 to 2B233, 2D201 or 2D202.
2E301"Technology" according to the General Technology Note for the "use" of goods specified in 2B350 to 2B352.
Table
Deposition techniques
| The numbers in parenthesis refer to the Notes following this Table. | ||
| 1. Coating Process (1)f1 | 2. Substrate | 3. Resultant Coating |
|---|---|---|
| A. Chemical Vapour Deposition (CVD) | "Superalloys" | Aluminides for internal passages |
| Ceramics (19) and Low expansion glasses (14) | Silicides Carbides Dielectric layers (15) Diamond Diamond-like carbon (17) | |
| Carbon-carbon, Ceramic and Metal "matrix""composites" | Silicides Carbides Refractory metals Mixtures thereof (4) Dielectric layers (15) Aluminides Alloyed aluminides (2) Boron nitride | |
| Cemented tungsten carbide (16), Silicon carbide (18) | Carbides Tungsten Mixtures thereof (4) Dielectric layers (15) | |
| Molybdenum and Molybdenum alloys | Dielectric layers (15) | |
| Beryllium and Beryllium alloys | Dielectric layers (15) Diamond Diamond-like carbon (17) | |
| Sensor window materials (9) | Dielectric layers (15) Diamond Diamond-like carbon (17) | |
| B. Thermal-Evaporation Physical Vapour Deposition (TE-PVD) | ||
| B.1. Physical Vapour Deposition (PVD): Electron-Beam (EB-PVD) | "Superalloys" | Alloyed silicides Alloyed aluminides (2) MCrAlX (5) Modified zirconia (12) Silicides Aluminides Mixtures thereof (4) |
| Ceramics (19) and Low expansion glasses (14) | Dielectric layers (15) | |
| Corrosion resistant steel (7) | MCrAlX (5) Modified zirconia (12) Mixtures thereof (4) | |
| Carbon-carbon, Ceramic and Metal "matrix""composites" | Silicides Carbides Refractory metals Mixtures thereof (4) Dielectric layers (15) Boron nitride | |
| Cemented tungsten carbide (16), Silicon carbide (18) | Carbides Tungsten Mixtures thereof (4) Dielectric layers (15) | |
| Molybdenum and Molybdenum alloys | Dielectric layers (15) | |
| Beryllium and Beryllium alloys | Dielectric layers (15) Borides Beryllium | |
| Sensor window materials (9) | Dielectric layers (15) | |
| Titanium alloys (13) | Borides Nitrides | |
| B.2. Ion assisted resistive heating Physical Vapour Deposition (PVD) (Ion Plating) | Ceramics (19) and Low-expansion glasses | Dielectric layers (15) Diamond-like carbon (17) |
| Carbon-carbon, Ceramic and Metal "matrix""composites" | Dielectric layers (15) | |
| Cemented tungsten carbide (16), Silicon carbide | Dielectric layers (15) | |
| Molybdenum and Molybdenum alloys | Dielectric layers (15) | |
| Beryllium and Beryllium alloys | Dielectric layers (15) | |
| Sensor window materials (9) | Dielectric layers (15) Diamond-like carbon (17) | |
| B.3. Physical Vapour Deposition (PVD): "Laser" Vaporization | Ceramics (19) and Low expansion glasses (14) | Silicides Dielectric layers (15) Diamond-like carbon (17) |
| Carbon-carbon, Ceramic and Metal "matrix""composites" | Dielectric layers (15) | |
| Cemented tungsten carbide (16), Silicon carbide | Dielectric layers (15) | |
| Molybdenum and Molybdenum alloys | Dielectric layers (15) | |
| Beryllium and Beryllium alloys | Dielectric layers (15) | |
| Sensor window materials (9) | Dielectric layers (15) Diamond-like carbon (17) | |
| B.4. Physical Vapour Deposition (PVD): Cathodic Arc Discharge | "Superalloys" | Alloyed silicides Alloyed aluminides (2) MCrAlX (5) |
| Polymers (11) and Organic "matrix""composites" | Borides Carbides Nitrides Diamond-like carbon (17) | |
| C. Pack cementation (see A above for out-of-pack cementation) (10) | Carbon-carbon, Ceramic and Metal "matrix""composites" | Silicides Carbides Mixtures thereof (4) |
| Titanium alloys (13) | Silicides Aluminides Alloyed aluminides (2) | |
| Refractory metals and alloys (8) | Silicides Oxides | |
| D. Plasma spraying | "Superalloys" | MCrAlX (5) Modified zirconia (12) Mixtures thereof (4) Abradable Nickel-Graphite Abradable materials containing Ni-Cr-Al Abradable Al-Si-Polyester Alloyed aluminides (2) |
| Aluminium alloys (6) | MCrAlX (5) Modified zirconia (12) Silicides Mixtures thereof (4) | |
| Refractory metals and alloys (8) | Aluminides Silicides Carbides | |
| Corrosion resistant steel (7) | MCrAlX (5) Modified zirconia (12) Mixtures thereof (4) | |
| Titanium alloys (13) | Carbides Aluminides Silicides Alloyed aluminides (2) Abradable Nickel-Graphite Abradable materials containing Ni-Cr-Al Abradable Al-Si-Polyester | |
| E. Slurry Deposition | Refractory metals and alloys (8) | Fused silicides Fused aluminides except for resistance heating elements |
| Carbon-carbon, Ceramic and Metal "matrix""composites" | Silicides Carbides Mixtures thereof (4) | |
| F. Sputter Deposition | "Superalloys" | Alloyed silicides Alloyed aluminides (2) Noble metal modified aluminides (3) MCrAlX (5) Modified zirconia (12) Platinum Mixtures thereof (4) |
| Ceramics and Low- expansion glasses (14) | Silicides Platinum Mixtures thereof (4) Dielectic layers (15) Diamond-like carbon (17) | |
| Titanium alloys (13) | Borides Nitrides Oxides Silicides Aluminides Alloyed aluminides (2) Carbides | |
| Carbon-carbon, Ceramic and Metal "matrix""composites" | Silicides Carbides Refractory metals Mixtures thereof (4) Dielectric layers (15) Boron nitride | |
| Cemented tungsten carbide (16), Silicon carbide (18) | Carbides Tungsten Mixtures thereof (4) Dielectric layers (15) Boron nitride | |
| Molybdenum and Molybdenum alloys | Dielectric layers (15) | |
| Beryllium and Beryllium alloys | Borides Dielectric layers (15) Beryllium | |
| Sensor window materials (9) | Dielectric layers (15) Diamond-like carbon (17) | |
| Refractory metals and alloys (8) | Aluminides Silicides Oxides Carbides | |
| G. Ion Implantation | High temperature bearing steels | Additions of Chromium Tantalum or Niobium (Columbium) |
| Titanium alloys (13) | Borides Nitrides | |
| Beryllium and Beryllium alloys | Borides | |
| Cemented tungsten carbide (16) | Carbides Nitrides | |
- Note:Division Note:
- TABLE - DEPOSITION TECHNIQUES - NOTES
- TABLE - DEPOSITION TECHNIQUES - TECHNICAL NOTE
Annotations
Footnotes
- f1
-
The numbers in parenthesis refer to the Notes following this Table.