Chapter GROUP 3I Chemicals, Metalloids and Petroleum Products
| IL1702 | Hydraulic fluids which contain as the principal ingredient petroleum (mineral) oils, synthetic hydrocarbon oils, non-fluorinated silicones or fluorocarbons and which have all of the following characteristics— | C |
(a) a flash point of greater than 477 K (204°C); (b) a pour point of 239 K (−34°C) or lower; (c) a viscosity index of 75 or greater; and (d) thermally stable at 616 K (343°C). | ||
| Notes
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| IL1715 | Boron, the following— | |
(a) Boron element (metal) in all forms | C | |
(b) Boron compounds, mixtures, and composites containing 5% or more of boron (except pharmaceutical preparations packaged for retail sale), the following— | ||
(1) non-ceramic boron-nitrogen compounds (e.g. borazanes, borazines and boropyrazoyls) | C | |
(2) boron hydrides (e.g. boranes), except sodium boron hydride, potassium boron hydride, monoborane, diborane and triborane | C | |
(3) organoboron compounds, including metallo-organoboron compounds | C | |
| PL7006 | Boron compounds and mixtures in which the boron—10 isotope comprises more than 20% of the total boron content | W |
| IL1733 | Base materials, non-composite ceramic materials, ceramic-ceramic composite materials and precursor materials for the manufacture of high temperature fine technical ceramic products, the following— | |
(a) Base materials having all the following characteristics— | C | |
(1) any of the following compositions— (i) single or complex oxides of zirconium, and complex oxides of silicon and aluminium; (ii) single or complex borides of zirconium; (iii) single or complex carbides of silicon or boron; or (iv) single or complex nitrides of silicon, boron, aluminium, or zirconium; (2) total metallic impurities, excluding intentional additions, of less than— (i) 1,000 ppm for single oxides or carbides; (ii) 5,000 ppm for complex compounds, single borides or single nitrides; and (3) average particle size less than or equal to 5 micrometers and no more than 10% of the particles larger than 10 micrometers except for zirconia where these limits are 1 micrometre and 5 micrometres respectively. | ||
(b) Non-composite ceramic materials, in crude or semi-fabricated form, composed of any material specified in head (a) above, except abrasives | C | |
(c) Ceramic-ceramic composite materials containing finely dispersed particles or phases or any non-metallic fibrous or whisker-like materials, whether externally introduced or grown in situ during processing, where the following materials form the host matrix— | ||
(1) all oxides, including glasses | C | |
(2) carbides or nitrides of silicon or boron | C | |
(3) borides or nitrides of zirconium or boroides, carbides or nitrides of hafnium | C | |
(4) any combination of the materials specified in subheads (c)(1) to (3) above | C | |
| except manufactured products or components not specified elsewhere in this Schedule
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(1) polycarbosilanes and polydiorganosilanes (for producing silicon carbide) | C | |
(2) polysilazanes (for producing silicon nitride) | C | |
(3) polycarbosilazines for producing ceramics with silicon, carbon and nitrogen components | C | |
| In this entry—
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| IL1734 | Low density rigid, carbon-bonded, fibrous or non-fibrous carbon thermal insulating materials having all of the following characteristics— | C |
(a) a capability of operating at temperatures greater than 2273 K (2000°C); (b) a density greater than 100 kg/m3 and less than 300 kg/m3; (c) a compressive strength greater than 0.1Mpa and less than 1.0 Mpa; (d) a flexural strength greater than 1.0 Mpa; and (e) a carbon content of greater than 99.9% of total solids. | ||
| IL1746 | Polymeric substances, the following: and manufactures thereof— | |
(a) Polyimides (including maleimides) | C | |
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(b) Polybenzimidazoles | C | |
(c) Aromatic polyamides, including heterocyclic aromatic polyamides characterised as aromatic due to the presence of a benzene ring | C | |
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(d) Polyabenzothiazoles | C | |
(e) Polyoxadiazoles | C | |
(f) Polyphosphazenes (Polyphosphonitriles) | C | |
(g) Polystyrylpyridine (PSP) | C | |
(h) Thermopolastic liquid crystal copolyesters, the following— | ||
(1) ethylene copolyesters of terephthalic acid and parahydroxy-benzoic acid | C | |
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(2) phenylene or biphenylene copolyesters of terephthalic acid and parahydroxybenzoic acid | C | |
(i) Polybenzoxozoles | C | |
(j) Aromatic polyether ether ketones (PEEK) | C | |
(k) Butadiene polymers, the following— | ||
(1) carboxyl terminated polybutadienes (CTPB); hydroxyl terminated polybutadienes (HTPB); thiol terminated polybutadienes (TTPB); vinyl terminated polybutadiene (VTPB) cyclised 1-2 polybutadiene | C | |
(2) mouldable copolymers of butadiene and acrylic acids | C | |
(3) mouldable terpolymers of butadiene, acrylonitrile, acrylic acid or any of the homologues of acrylic acid | C | |
(l) Carboxyl terminated polyisoprene | C | |
| There shall be excluded from this entry manufactured articles where the value of the polymeric component together with materials specified elsewhere in this Schedule is less than 50% of the total. In this entry—
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| IL1749 | Polycarbonate sheet of 1.5 mm to 25.4 mm thickness, having no major defects and having all of the following optical characteristics— | C |
(a) less than 2% haze as determined by method ASTM D1003; (b) an angular deviation, as determined by method ASTM D637, as follows— (1) not more than 12 minutes at any location more than 25.4 mm from the edge of the sheet for sheet thickness of 1.5 mm to 9.5 mm; or (2) not more than 20 minutes at any location more than 25.4 mm from the edge of the sheet for sheet thickness over 9.5 mm to 25.4 mm; (c) total number of minor optical defects (excluding those within 25.4 mm of the sheet edge) as follows— (1) not exceeding 1 per 0.368 m2 for sheet which is 12.7 mm or less in thickness; or (2) not exceeding 2 per 0.092 m2 for sheet over 12.7 mm in thickness. | ||
| In this entry—
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| IL1754 | Fluorinated compounds, materials and manufactures thereof, the following—
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(1) dibromotetrafluoroethane, except when having a purity of 99.8% or less and containing at least 25 particles, of 200 micrometres or larger in size per 100 ml | C | |
(2) perfluoroalkylamines | C | |
(b) Polymeric materials and intermediates, unprocessed, the following— | ||
(1) polychlorotrifluoroethylene, oily and waxy modifications only | C | |
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(2) fluoroelastomeric compounds composed of at least 95% of a combination of two or more of the following monomers: tetrafluoroethylene, chlorotrifluoroethylene vinylidene fluoride, hexafluoropropylene, bromotrifluoroethylene, iodotrifluoroethylene, perfluoromethylvingylether and perfluoropro-poxypropylvinylether | C | |
(3) polybromotrifluoroethylene | C | |
(4) copolymers of vinylidene fluoride having 75% or more beta crystalline structure without stretching | C | |
(5) fluorinated silicone rubber and intermediates for their production containing 10% or more of combined fluorine | C | |
(c) Manufactures, the following— | ||
(1) greases, lubricants and dielectric, damping and flotation fluids made of at least 85% of any of the materials specified in head (a) or (b) above | C | |
(2) electric wire and cable coated with or insulated with any of the materials specified in sub head (b)(2) above, except oil well logging cable | C | |
(3) seals, gaskets, rods, sheets, sealants or fuel bladders made of more than 50% of any of the materials specified in subhead (b)(2) above and specially designed for aerospace and aircraft use | C | |
(4) piezoelectric polymers and copolymers made from vinylidene fluoride having both of the following characteristics— | C | |
(i) in sheet or film form; and (ii) with a thickness of more than 200 micrometres. | ||
| IL1755 | Silicone fluids and greases, the following— | |
(a) Fluorinated silicone fluids, except those with kinematic viscosity of 5,000 centistokes or higher measured at 25°C | C | |
(b) Silicone and fluorinated silicone lubricating greases capable of operating at temperature of 478 K (205°C) or higher and having a drop point (method of test being ASTM D2265) of 493 K (220°C) or higher | C | |
| IL1757 | Compounds and materials, the following— | |
(a) Monocrystalline silicon | C | |
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(b) Gallium of a purity equal to or greater than 99.9999% and gallium III/V compounds of any purity level | C | |
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(c) Indium of a purity greater than 99.9995% and III-V indium compounds containing more than 1% indium | C | |
(d) Hetero-epitaxial materials consisting of a monocrystalline insulating substrate epitaxially layered with silicon, compounds of gallium or compounds of indium | C | |
(e) Elemental Cd and Te of purity levels equal to or more than 99.9995% CdTe compounds of a purity level equal to or more than 99.99% and single crystals of CdTe of any purity level | C | |
(f) Polycrystalline silicon, (except polycrystalline silicon having a purity not better than 99.99% and containing at least 0.5 part in 106 each of iron, carbon, boron and phosphorus, plus other impurities) | C | |
(g) SiCl2H2 with a purity level of 97.0 per cent or better and compounds having a purity level based upon the amount of the primary constituents of 99.5% or better and used in the synthesis of the materials specified in head (f) above, or used as the silicon source in the deposition of epitaxial layers of silicon, silicon oxide or silicon nitride | C | |
(h) Single crystals sapphire substrates | C | |
(i) B2O3 with a purity of 99.9% or greater, containing 1,000 parts per million of H2O or less, in powder or cast form | C | |
(j) Monocrystalline germanium with a resistivity greater than 100 ohm cm | C | |
(k) Resist, materials, the following— | ||
(1) negative resists whose spectral response has been adjusted for use below 350 nanometres | C | |
(2) all positive resists | C | |
(3) all resists for use with E-beams or ion beams with a sensitivity of 100 microcoulomb/cm2 or better | C | |
(4) all resists for use with X-rays with a sensitivity of 500 millijoules/cm2 or better | C | |
(5) all resists specified or optimized for dry development | C | |
(l) Single-crystal forms of bismuth germanium oxide having piezoelectric properties and single-crystal forms of lithium niobate, of lithium tantalate and of aluminium phosphate | C | |
(m) Metal-organic or hydride compounds of beryllium and magnesium (Group IIA), zinc, cadmium and mercury (Group IIB), aluminium, gallium and indium (Group IIIA), phosphorus, arsenic and antimony (Group VA) and selenium and tellurium (Group VIA) having a purity (metal basis) of 99.999% or better | C | |
| IL1759 | Syntactic foam for under water use formulated for applications at depths greater than 1000 metres or with a density of 0.561g/cm3 (specific gravity 0.561) or less | C |
| In this entry—
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| IL1760 | Tantalates and niobates having a purity of 99% or better except fluorotantalates | C |
| IL1763 | Fibrous and filamentary materials which may be used in organic matrix, metallic matrix or carbon matrix composite structures or laminates, and such composite structures and laminates and technology therefor, the following and specially ODMA software therefor— | |
(a) Fibrous and filamentary materials with specific modulus greater than 3.18 × 106m and specific tensile strength greater than 7.62 × 104m except silicate glass fibres | C | |
(b) Fibrous and filamentary materials having both of the following characteristics— | C | |
(1) specific modulus greater than 2.54 × 106m and; (2) melting or sublimation point higher than 1,992 K (1.649°C) in an inert environment; | ||
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| There shall be excluded from heads (a) and (b) carbon fibres having both of the following characteristics:
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(c) Resin or pitch-impregnated fibres (prepregs), metal or carbon-coated fibres (preforms) or carbon fibre preforms made with materials specified in head (a) or (b) above | C | |
(d) Composite structures, laminates and manufactures thereof for products and components made either with an organic matrix, a carbon matrix or a metal matrix utilising materials specified in head (a), (b) or (c) above | C | |
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(e) Technology for fibrous and filamentary materials and for composite structures and laminates, the following— | ||
(1) technology which is unique to the spinning and subsequent treatment of precursor materials into fibres specially designed for processing into carbon filamentary materials specified in head (a) or (b) above | D | |
(2) technology for the production of fibrous and filamentary materials specified in head (a) or (b) above | D | |
(3) technology for the production of prepregs specified in head (c) above using pressure impregnation or chemical vapour deposition, and for preforms specified in head (c) above using vacuum or pressure impregnation of chemical vapour deposition | D | |
(4) technology for the development and production of composite structures, laminates and manufactures specified in head (d) above | D | |
(5) technology for rigidisation and densification processes specially designed for the manufacture of carbon-carbon composite materials, the following— | ||
(i) for impregnation, infiltration or deposition into carbon fibre preforms | D | |
(ii) for carbonisation | D | |
(iii) for graphitisation | D | |
(iv) for hot isostatic pressing | D | |
| In this entry—
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| IL1767 | Preforms of glass or of any other material specially designed for the fabrication of optical fibres specified in heads (b) or (c) in entry IL1526 in Group 3F relating to cable and wire | C |
| In this entry “optical fibre preforms” means bars, ingots, or rods of glass, plastic or other materials which have been specially processed for use in fabricating optical fibres. | ||
| IL1781 | Synthetic lubicating oils and greases which are or which contain, as their principal ingredient, the following— | |
(a) Monomeric and polymeric forms of perfluorotriazines, perfluoroaromatic ethers and esters, and perfluoroaliphatic ethers and esters | C | |
(b) Polyphenyl ethers or thio ethers containing more than three phenyl or alkyl phenyl groups | C | |
| PL7007 | Chemicals, the following— | |
(a) Chloroethanl | W, L, I, Y | |
(b) Dimethylamine | W, L, I, Y | |
(c) Dimethylamine hydrochloride | W, L, I, Y | |
(d) Dimethyl methylphosphate | W, L, I, Y | |
(e) Dimethylphosphite | W, L, I, Y | |
(f) Hydrogen fluoride | L, I, Y | |
(g) Methyl phosphonyl dichloride | W, L, I, Y | |
(h) Methyl phosphonyl difluoride | W, L, I, Y | |
(i) Phosphorus oxychloride | W, L, I, Y | |
(j) Phosphorus trichloride | W, L, I, Y | |
(k) Potassium fluoride | W, L, I, Y | |
(l) Thiodiglycol | W, L, I, Y | |
(m) Thionyl chloride | W, L, I, Y | |
(n) Trimethylphosphite | W, L, I, Y | |
(o) Tris-ethanolamine | W, L, I, Y |