OpenLegislation

Paragraph 157 DEFINITIONS OF TERMS IN THIS ANNEX

Changes not yet applied. Later legislation changes this provision in ways not yet written into the text below:

“Sputtering” (4) means an overlay coating process wherein positively charged ions are accelerated by an electric field towards the surface of a target (coating material). The kinetic energy of the impacting ions is sufficient to cause target surface atoms to be released and deposited on the substrate.

  • N.B.: Triode, magnetron or radio frequency sputtering to increase adhesion of coating and rate of deposition are ordinary modifications of the process.